Projection objective for lithography

ABSTRACT

In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.

CROSS-REFERENCE TO RELATED APPLICATION

This application is a continuation of U.S. application Ser. No.12/014,496, filed Jan. 15, 2008, which claims priority under 35 U.S.C.§119 of German patent application serial number 10 2007 005 564.3 filedon Jan. 23, 2007, which is hereby incorporated by reference.

FIELD

The disclosure relates to a projection objective for lithography.

BACKGROUND

A projection objective is commonly used in the field of lithographic, inparticular microlithographic production of semiconductors, during whichan object provided with a structure, which is also denoted as a reticle,is imaged using the projection objective onto a substrate which isdenoted as a wafer. The object provided with the structure is typicallyarranged in an object plane of the projection objective, and thesubstrate (wafer) is arranged in an image plane of the projectionobjective. The substrate is often provided with a photosensitive layerupon the exposure of which via light through the projection objectivethe structure of the object is transferred onto the photosensitivelayer. The desired structure can arise on the substrate afterdevelopment of the photosensitive layer, the exposure operation beingmultiply repeated, depending on circumstances.

Various designs of projection objectives are known and include dioptricprojection objectives (refractive elements and no reflective elements),catoptric projection objectives (reflective elements and no refractiveelements) and catadioptric projection objectives (refractive elementsand reflective elements).

SUMMARY

The disclosure relates to a projection objective for lithography. Theprojection objective can have at least one intermediate image planebetween the object plane and the image plane. An intermediate image ofthe object to be imaged and which is arranged in the object plane can beproduced in the intermediate image plane.

Both the intrinsic aberrations and those occurring during operation canassume various field profiles in the image plane of the projectionobjective. It is possible in this case to distinguish betweenfield-constant aberrations and field-dependent (i.e. not field-constant)aberrations. In some embodiments, both the field-constant and thefield-dependent aberrations can be measured and/or corrected duringoperation of the projection objective. Optionally, this can be done withthe aid of as few design measures as possible. In certain embodiments,the present disclosure provides a projection objective that can measurefor correcting aberrations with both a field-constant profile and with afield-dependent profile with the aid of a low outlay on design.

The disclosure provides a projection objective of a lithographicprojection exposure machine, including an optical arrangement of opticalelements between an object plane and an image plane, the arrangementhaving at least one intermediate image plane, the arrangement furtherhaving at least two correction elements for correcting aberrations, ofwhich a first correction element is arranged optically at least in thevicinity of a pupil plane and a second correction element is arranged ina region which is not optically near either a pupil plane or a fieldplane.

In the case of the projection objective whose optical arrangement ofoptical elements has at least one intermediate image plane between theobject plane and the image plane, at least two correction elements forcorrecting aberrations (e.g., exactly two correction elements forcorrecting aberrations or exactly three correction elements forcorrecting aberrations), which are arranged at specific positions of theprojection objective, can be provided as measures for correctingaberrations. The first correction element can be optically arranged inthis case at least in the vicinity of a pupil plane. It is also to beunderstood in this context that the first correction element can also bearranged exactly in a pupil plane of the projection objective. Since theoptical action of an optical element in a pupil plane in the image planeof the projection objective exhibits an approximately field-constantprofile, the first correction element can be used to correct aberrationswith a field-constant profile.

The second correction element, by contrast, can be arranged in anintermediate region, that is to say a region which is not optically neareither a pupil plane or a field plane. An optical element which isarranged in such an intermediate region between pupil and field exhibitson the profile of the image in the image plane an optical action whichhas both field-constant and field-dependent components. The secondcorrection element can therefore be used to attack aberrations having aprofile which is at least also field dependent.

Alongside the at least one intermediate image plane, a field plane isalso to be understood here as the object plane and the image plane. Aprojection objective according to the disclosure therefore has at leastthree field planes.

The term “optically near” is to be understood to mean that the positionof the first or second correction element is not a matter of the spatialposition with reference to the pupil plane or to the field plane, butrefers to the optical action of this position. An “optically near”position is therefore not defined by the spatial distance of thisposition from the pupil plane or the field plane, the essential pointbeing, rather, the optical action exerted by an optical element arrangedat this position on the imaging into the pupil plane.

In some embodiments, the position of the first correction element isselected such that the absolute value of a ratio of principal-ray heightto marginal-ray height at this position is less than 1/n, where n=5,n=10, or n=20.

Principal-ray height is understood as the ray height of the principalray of a field point of the object plane with a field height of maximumabsolute value. Marginal-ray height is understood as the ray height of abeam of maximum aperture emanating from the center of the field of theobject plane. The ratio of principal ray height to marginal ray heightat a specific position in the beam path of the projection objective is acriterion which can be used to determine whether the position is locatedoptically in the vicinity of a pupil plane or optically in the vicinityof a field plane. This ratio is zero directly in a pupil plane and verymuch greater than 1, at least greater than 10, in a field plane. To theextent that the original design of the projection objective of which thecorrective measures according to the disclosure are to be provided doesnot permit a first correction element to be arranged directly in a pupilplane, a search is made in the case of the present refinement for aposition at which the ratio of principal ray height to marginal rayheight is less than 1/5.

In certain embodiments, the position of the second correction element isselected such that the absolute value of a ratio of principal-ray heightto marginal-ray height at this position is greater than 1/m, but lessthan p/10, where m=20, or m=10, or m=5, and p=55, or p=35, or p=25, orp=20, or p=17.

Such a selection of the position of the second correction element canadvantageously ensure that the second correction element is not locatedoptically near either a pupil plane or a field plane.

In some embodiments, in the case in which, seen in the light propagationdirection, the arrangement of optical elements includes a firstsubassembly which images the object plane via a first pupil plane intothe intermediate image plane and a second subassembly which images theintermediate image plane via a second pupil plane into the image plane,the first correction element is arranged optically at least in thevicinity of the second pupil plane, and the second correction element isarranged downstream of the intermediate image plane and upstream of thesecond pupil plane and is not optically near either the intermediateimage plane or the second pupil plane.

In some embodiments, in the case in which, seen in the light propagationdirection, the arrangement of optical elements includes a firstsubassembly which images the object plane via a first pupil plane intothe intermediate image plane and a second subassembly which images theintermediate image plane via a second pupil plane into the image plane,the first correction element is arranged optically at least in thevicinity of the second pupil plane, and the second correction element isarranged upstream of the first pupil plane and is not optically neareither the object plane or the first pupil plane.

In certain embodiments, in the case in which, seen in the lightpropagation direction, the arrangement of optical elements includes afirst subassembly which images the object plane via a first pupil planeinto a first intermediate image plane, a second subassembly which imagesthe first intermediate image plane via a second pupil plane into asecond intermediate image plane and a third subassembly which images thesecond intermediate image plane via a third pupil plane into the imageplane, the first correction element is arranged optically at least inthe vicinity of the first pupil plane, and the second correction elementis arranged between the first pupil plane and the first intermediateimage plane, and is not optically near either the first pupil plane orthe first intermediate image plane.

In some embodiments, in the case in which, seen in the light propagationdirection, the arrangement of optical elements includes a firstsubassembly which images the object plane via a first pupil plane intoan intermediate image plane, a second subassembly which images the firstintermediate image plane via a second pupil plane into a secondintermediate image plane and a third subassembly which images the secondintermediate image plane via a third pupil plane into the image plane,the first correction element is arranged optically at least in thevicinity of the first pupil plane, and the second correction element isarranged between the object plane and the first pupil plane, and is notoptically near either the object plane or the first pupil plane.

In the context of the previously mentioned refinement of the projectionobjective it is possible in addition to arrange a third correctionelement optically at least in the vicinity of the third pupil plane.

In some embodiments, in the case in which, seen in the light propagationdirection, the arrangement of optical elements includes a firstsubassembly which images the object plane via a first pupil plane into afirst intermediate image plane, a second subassembly which images thefirst intermediate image plane via a second pupil plane into a secondintermediate image plane and a third subassembly which images the secondintermediate image plane via a third pupil plane into the image plane,the first correction element is arranged optically at least in thevicinity of the third pupil plane, and the second correction element isarranged between the object plane and the first pupil plane, and is notoptically near either the object plane or the first pupil plane.

In certain embodiments, in the case in which, seen in the lightpropagation direction, the arrangement of optical elements includes afirst subassembly which images the object plane via a first pupil planeinto the intermediate image plane and a second subassembly which imagesthe intermediate image plane into the image plane, the first correctionelement is arranged optically at least in the vicinity of the secondpupil plane, and the second correction element is arranged between theobject plane and the first pupil plane, and is not optically near theobject plane nor the first pupil plane.

In some instances, it can be particularly advantageous when thearrangement includes precisely two correction elements or threecorrection elements.

The advantage can be that the overall outlay on the correction measurescan be kept low, and yet there is a high correction potential inrelation to correcting field-constant or field-dependent aberrations.

In certain embodiments, at least one of the correction elements can beexchanged during the operation of the projection objective.

This can allow for relatively quick reaction during operation of theprojection objective to aberrations occurring during operation,particularly when there are held ready a plurality of first correctionelements and a plurality of second correction elements which, dependingon the aberrations which occur, can be exchanged against one anotherquickly, for example via a quick changer.

In some embodiments, at least one of the correction elements is a planeplate. Optionally, both correction elements can be plane plates.

In certain embodiments, at least one of the correction elements has anaspherization. Optionally, both correction elements can have anaspherization.

In some embodiments, at least one of the correction elements can beactively deformed, and in this case one or more aberrations cancorrected by deforming the correction element during operation of theprojection objective.

In certain embodiments, at least one of the correction elements can bethermally manipulated.

What is to be understood by this is that the thermally manipulablecorrection element is connected to a heat source/heat sink via which thecorrection element can be heated or cooled in order thereby to set theoptical action of the correction element to compensate one or moreaberrations.

In some embodiments, at least one of the correction elements can beadjusted in position.

Depending on what is desired for the correction potential, thepositional adjustment can be restricted to a displacement or a rotationand/or tilting, or can include all possible degrees of freedom oftranslation and rotation and/or tilting.

Further advantages and features are to be seen from the followingdescription and the attached drawing.

It goes without saying that the abovementioned features, and those stillto be explained below, can be used not only in the respectivelyspecified combination, but also in other combinations or on their ownwithout departing from the scope of the present disclosure.

BRIEF DESCRIPTION OF THE DRAWINGS

Exemplary embodiments of the disclosure are illustrated in the drawingand will be explained in more detail below with reference to thedrawing, in which:

FIG. 1 shows a projection objective;

FIG. 2 shows a projection objective;

FIG. 3 shows a projection objective;

FIG. 4 shows a projection objective;

FIG. 5 shows a projection objective;

FIG. 6 shows a projection objective; and

FIG. 7 shows a projection objective.

DETAILED DESCRIPTION

Illustrated in FIG. 1 is a projection objective which is provided withthe general reference 10 and is used for the lithographic production ofcomponents.

The projection objective 10 includes an optical arrangement 12 of aplurality of optical elements between an object plane O and an imageplane B. The optical arrangement 12 further has an intermediate imageplane Z.

Seen in the light propagation direction from the object plane O to theimage plane B, the optical arrangement 12 of the projection objective 10can be subdivided into two subassemblies, specifically a firstsubassembly G₁ and a second subassembly G₂.

The first subassembly G₁ images the object plane O, or an objectarranged therein, via a first pupil plane P₁ into the intermediate imageplane Z. The first subassembly is catadioptric. It has three lenses andtwo mirrors M₁ and M₂. The pupil plane P₁ is located approximately atthe position of the mirror M₁.

The second subassembly G₂ is dioptric and images intermediate image Zvia a second pupil plane P₂ into the image plane B. The secondsubassembly has a plurality of lenses.

The projection objective 10, which has an intermediate image plane Z,correspondingly has three field planes, specifically the field plane F₁which is formed by the object plane, the field plane F₂ which is formedby the intermediate image plane Z, and the field plane F₃ which isformed by the image plane B.

The arrangement 12 includes two correction elements K₁ and K₂ forcorrecting aberrations.

The first correction element K₁ is arranged optically near the secondpupil plane P₂. In this case, the first correction element K₁ is locatedvirtually in the pupil plane P₂. The ratio of principal ray height tomarginal ray height is virtually zero at the position of the correctionelement K₁.

Seen in the light propagation direction, the second correction elementK₂ is arranged downstream of the intermediate image plane Z and upstreamof the second pupil plane P₂, and is not optically near any of these twoplanes. The ratio of principal ray height to marginal ray height at theposition of the correction element K₂ is, on the one hand, clearlydifferent from zero, but not substantially greater than one, on theother hand.

The optical data of the projection objective 10 are summarized inTable 1. The basic design of the projection objective without correctionelements is, furthermore, described in US 2006/0256447 A1, to whichreference is made for further details and which is hereby incorporatedby reference.

A projection objective provided with the general reference 20 isillustrated in FIG. 2.

The projection objective 20 has an optical arrangement 22 with aplurality of optical elements between an object plane O and an imageplane B. The projection objective 20 has an intermediate image plane Z.

As in the case of the exemplary embodiment in FIG. 1, the arrangement 22can be subdivided into two subassemblies. A first subassembly G₁ whichis catadioptric images the object plane O via a first pupil plane P₁into the intermediate image plane Z. The first subassembly G₁ includestwo mirrors M₁ and M₂.

A second subassembly G₂ images the intermediate image Z via a secondpupil plane P₂ into the image plane B. The second subassembly G₂ has thetwo mirrors M₃ and M₄ and a plurality of lenses, and is thuscatadioptric.

In order to correct aberrations, arrangement 22 has two correctionelements, specifically a first correction element K₁ which is arrangedoptically near the second pupil plane P₂, specifically at a position atwhich there is an adequate interspace between two neighboring lenses.

A second correction element K₂ is arranged between the object plane Oand the first pupil plane P₁, the position of the correction element K₂being selected such that it is not optically near either the pupil planeP₁ or the object plane O.

While the ratio of principal ray height to marginal ray height at theposition of the correction element K₁ is close to zero, this ratio atthe position of the correction element K₂ is approximately between 0.5and 2.

The optical data of the projection objective 20 are summarized in Table2. The basic design of the projection objective 20 without correctionelements is, furthermore, described in US 2006/0256447 A1, to whichreference is made for further details.

FIG. 3 shows a further exemplary embodiment of a projection objective 30according to the disclosure.

The projection objective 30 includes an optical arrangement 32 composedof a plurality of optical elements between an object plane O and animage plane B. The optical elements include lenses and mirrors.

The projection objective 30 has a total of two intermediate image planesZ₁ and Z₂.

The optical arrangement 32 can be divided overall into threesubassemblies G₁, G₂ and G₃.

The first subassembly G₁ images the object plane O via a first pupilplane P₁ into the first intermediate image plane Z₁. The firstsubassembly G₁ is dioptric, that is to say it consists only ofrefractive elements, here lenses.

The second subassembly G₂ is catoptric, that is to say consists only ofmirrors, and specifically the mirrors M₁ and M₂. The second subassemblyG₂ images the intermediate image plane Z₁ via a second pupil plane P₂into the second intermediate image plane Z₂.

The third subassembly G₃ is again dioptric, that is to say consists onlyof refractive elements and images the intermediate image plane Z₂ intothe image plane B.

The projection objective 30 correspondingly has four field planes F₁ toF₄.

The arrangement 32 further includes a first correction element K₁ and asecond correction element K₂.

The first correction element K₁ is located optically near the firstpupil plane P₁. The second correction element K₂ is located between thefirst pupil plane P₁ and the first intermediate image plane Z₁, but isnot optically near either the first pupil plane P₁ or the firstintermediate image plane Z₁. This results from the fact that althoughthe ratio of principal ray height to marginal ray height is less than 1at the position of the correction element K₂, it is clearly greater than0, being approximately 0.5.

The optical data of the projection objective 30 are summarized in Table3. The projection objective 30 without correction elements is furtherdescribed in WO 2006/055471 A1, to which reference is made for furtherdetails and which is hereby incorporated by reference.

Because of the design of the projection objective 30, the third pupilplane P₃ or the region around the pupil plane P₃ is not recommended forarranging a correction element, since the spacing between neighbouringlenses in this region is too small.

FIG. 4 shows a further exemplary embodiment of a projection objective40, which has an optical arrangement 42 composed of a plurality ofoptical elements, which include lenses and mirrors, between an objectplane O and an image plane B.

Like the projection objective 30, the projection objective 40 has twointermediate image planes Z₁ and Z₂. The projection objective 40 alsohas four field planes F₁ to F₄.

Seen in the light propagation direction, the optical arrangement 42 canbe divided into the subassemblies G₁, G₂ and G₃.

The first subassembly G₁ images the object plane O via a first pupilplane P₁ into the first intermediate image plane Z₁. The firstsubassembly G₁ is catadioptric and has a mirror M₁.

The second subassembly G₂ images the first intermediate image plane Z₁via a second pupil plane P₂, which is located at the position of amirror M₂, into the second intermediate image plane Z₂. The secondsubassembly G₂ is likewise catadioptric. The third subassembly G₃ imagesthe second intermediate image plane Z₂ via a third pupil plane P₃ intothe image plane B. The third subassembly G₃ has a mirror M₃ and aplurality of lenses, and is therefore catadioptric.

The arrangement 42 has two correction elements K₁ and K₂. The correctionelement K₁ is arranged in the first pupil plane P₁, and in the exemplaryembodiment shown specifically even exactly in the first pupil plane P₁between two opposite concave lens surfaces.

The second correction element K₂ is located between the object plane Oand the first pupil plane P₁, but is not optically near either theobject plane O or the first pupil plane P₁. The ratio of principal rayheight to marginal ray height is close to 1 at the position of thesecond correction element K₂.

On the basis of its design, the projection objective 40 would alsopermit the first correction element K₁ to be arranged approximately inthe third pupil plane P₃, since there is an interspace, although slight,between two lenses, which are arranged on both sides of the pupil planeP₃. This situation is illustrated in FIG. 5.

The optical data of the projection objective 40 in accordance with FIG.4 are summarized in Table 4, while the optical data of the projectionobjective 40 in accordance with FIG. 5 with the corresponding otherposition of the first correction element K₁ are summarized in Table 5.

The projection objective 40 in accordance with FIGS. 4 and 5, butwithout correaction elements, is described, furthermore, in WO2004/019128, to which reference may be made for further details andwhich is hereby incorporated by reference.

FIG. 6 shows a further exemplary embodiment of a projection objective 50which, as distinguished from the previously described projectionobjectives, is dioptric overall, that is to say is composed only fromrefractive elements.

The projection objective 50 has an optical arrangement 52 composed of aplurality of optical elements in the form of lenses, which are arrangedbetween an object plane O and an image plane B.

The arrangement 52 has an intermediate image Z, and can be divided intotwo subassemblies G₁ and G₂.

The first subassembly G₁, which is correspondingly dioptric, images theobject plane O via a first pupil plane P₁ into the intermediate imageplane Z. The second subassembly G₂, likewise dioptric, images theintermediate image plane Z via a second pupil plane P₂ into theintermediate image plane B.

The arrangement 52 has a total of two correction elements K₁ and K₂.

The first correction element K₁ is arranged optically near the secondpupil plane P₂. Although the first correction element K₁ is spatiallyseparated from the pupil plane P₂ by three lenses, the correctionelement K₁ is optically near the pupil plane P₂, since the ratio ofprincipal ray height to marginal ray height at the position of thecorrection element K₁ is only slightly different from 0, specificallysomewhat smaller than 1/10.

The second correction element K₂ is located between the object plane Oand the first pupil plane P₁, but is not optically near either objectplane O or pupil plane P₁. The ratio of principal ray height to marginalray height is only slightly greater than 1 at the position of thecorrection element K₂.

The optical data of the projection objective 50 are summarized in Table6. Projection objective 50 without correction element is also describedUS 2006/0056064 A1, to which supplementary reference is made and whichis hereby incorporated by reference.

Finally, a yet further exemplary embodiment of a projection objective40′ having an optical arrangement 42′ is illustrated in FIG. 7. Theprojection objective 40′ shown in FIG. 7 is similar in its basic designto the exemplary embodiments in FIGS. 4 and 5, and so reference may bemade to the description there.

As distinguished from the exemplary embodiments in FIGS. 4 and 5, theoptical arrangement 42′ has a total of three correction elements K₁, K₂and K₃. The first correction element K₁ is located in the first pupilplane P₁, or is at least optically near thereto, and the secondcorrection element K₂ is located between the object plane O and thepupil plane P₁ at a position which is not optically near either theobject plane O or the pupil plane P₁.

The third correction element K₃ is located optically near the thirdpupil plane P₃.

The optical data of the projection objective 40′ are summarized in Table7. The basic design of the projection objective 40′ without correctionelements is described in WO 2006/121008 A1, to which supplementaryreference is made and which is hereby incorporated by reference.

The following further measures are provided in the case of allpreviously described exemplary embodiments.

The first correction element K₁ and/or the second correction element K₂and/or the third correction element K₃ can be exchanged during theoperation of the projection objective 10, 20, 30, 40 or 50.“Exchangeable” in this sense means that the correction elements K₁and/or K₂ and/or K₃ can be quickly removed from or quickly introducedinto the light path, for example via a quick change mechanism. It isalso possible to hold ready for the first correction element K₁ and/orthe second correction element K₂ (and/or the third correction elementK₃) a plurality of exchange correction elements which are thenconfigured with other optical properties in order to be able to correctrespectively detected aberrations most effectively.

As illustrated in FIGS. 1 to 7, the first correction element K₁ and/orthe second correction element K₂ and/or the third correction element K₃can be designed as plane plates. The correction elements K₁ and K₂and/or K₃ therefore have no imaging optical action, but serve merely tocorrect aberrations. Moreover, because of the relatively small spacethey take up, plane plates can subsequently be inserted with particularadvantage into an existing objective design with small changes to theobjective design.

Depending on the corrective action to be achieved, the correctionelements K₁ and/or K₂ and/or K₃ can be provided with an aspherization,and/or they can be designed as actively deformable elements which areassigned corresponding deformation manipulators, and/or they can also beprovided with thermal manipulators which heat or cool the correctionelements K₁ and/or K₂ and/or K₃, in order to set the desired opticalcorrective action in the correction elements K₁ and/or K₂ and/or K₃.Furthermore, the correction elements K₁ and/or K₂ and/or K₃ can bedesigned in a positionally adjustable fashion in order to achieve aspecific optical corrective action, the correction elements K₁ and/or K₂and/or K₃ being assigned appropriate manipulators for adjustingposition. The positional adjustment can consist of displacements in thelight propagation direction or transverse to the light propagationdirection, or in superimpositions of these two directions, in rotations,tiltings etc.

The first correction element K₁, which is always arranged in thevicinity of a pupil plane, serves the purpose of correctingfield-constant aberrations, while the correction element K₂, which isalways arranged in an intermediate region between a field plane and apupil plane, serves to correct aberrations which have at leastfield-dependent components, as well.

TABLE 1 NA: 1.2, Field: A = 26 mm, B = 5.5, R = 11.5 mm, WL 193.368SURFACE RADII THICKNESSES GLASSES 193.368 nm ½ DIAMETER  0 0.0 78.303613AIR 1.00000000 68.000  1 −394.191214 41.739707 SIO2 1.56078570 89.318  2−198.169616 AS 0.996922 AIR 1.00000000 97.224  3 446.404208 56.197179SIO2 1.56078570 105.457  4 −184.168849 146.744728 AIR 1.00000000 105.917 5 −160.246412 AS 14.998293 CAF2 1.50185255 53.242  6 −1617.19682415.111401 AIR 1.00000000 63.827  7 −207.292891 −15.111401 REFL1.00000000 67.705  8 −1617.196824 −14.998293 CAF2 1.50185255 67.674  9−160.246412 AS −131.745949 AIR 1.00000000 67.172 10 −3715.402662 AS176.854423 REFL 1.00000000 91.197 11 −1112.237530 60.308635 SIO21.56078570 151.888 12 −229.362794 1.203111 AIR 1.00000000 155.623 13−3717.820612 AS 42.208898 SIO2 1.56078570 163.490 14 −347.3527703.017120 AIR 1.00000000 165.417 15 0.000000 15.000000 SIO2 1.56078570165.592 16 0.000000 3.026023 AIR 1.00000000 165.630 17 202.32544157.054809 SIO2 1.56078570 165.979 18 364.549775 AS 112.911698 AIR1.00000000 157.356 19 523.345363 AS 14.104445 SIO2 1.56078570 136.685 20273.861634 81.489838 AIR 1.00000000 129.939 21 155.304364 65.231336 SIO21.56078570 105.552 22 127.633723 54.935139 AIR 1.00000000 80.523 23−227.097829 AS 13.016244 SIO2 1.56078570 78.928 24 182.536777 46.455888AIR 1.00000000 84.166 25 −207.182814 61.528057 SIO2 1.56078570 87.897 26−176.528856 0.993891 AIR 1.00000000 110.784 27 865.127053 AS 12.999101SIO2 1.56078570 130.528 28 415.920005 19.152224 AIR 1.00000000 136.92129 1097.434748 63.443284 SIO2 1.56078570 140.520 30 −336.168712 0.998659AIR 1.00000000 147.380 31 2299.996269 35.799374 SIO2 1.56078570 157.76732 −716.010845 29.177622 AIR 1.00000000 159.443 33 451.524671 46.260303SIO2 1.56078570 166.030 34 −3021.353828 −2.567508 AIR 1.00000000 165.13735 0.000000 0.000000 AIR 1.00000000 164.803 36 0.000000 23.628165 AIR1.00000000 164.803 37 0.000000 15.000000 SIO2 1.56078570 163.773 380.000000 1.001035 AIR 1.00000000 163.354 39 422.935081 60.555463 SIO21.56078570 161.905 40 −852.100717 0.999943 AIR 1.00000000 159.604 41189.766568 49.041357 SIO2 1.56078570 131.068 42 708.548829 AS 0.999918AIR 1.00000000 125.218 43 126.232399 30.801444 SIO2 1.56078570 97.429 44170.774778 AS 0.997967 AIR 1.00000000 87.907 45 115.264122 28.743458CAF2 1.50185255 79.319 46 172.796848 AS 0.989848 AIR 1.00000000 66.33447 95.876561 47.472181 SIO2 1.56078570 57.697 48 0.000000 0.000000 IMM1.43667693 23.674 49 0.000000 3.000000 SIO2 1.56078570 23.674 500.000000 1.996512 IMM 1.43667693 20.051 51 0.000000 0.000000 AIR0.00000000 17.000 ASPHERIC CONSTANTS SRF 2 5 9 10 13 K 0 0 0 0 0 C11.392433e−09 1.801887e−08 1.801887e−08 −1.280168e−09 −1.440880e−10 C2−2.808823e−13 7.546535e−13 7.546535e−13 −4.640590e−17 −4.234605e−13 C3−1.371628e−18 2.174176e−17 2.174176e−17 −8.894827e−18 4.084291e−18 C41.424663e−20 7.624607e−22 7.624607e−22 2.947352e−22 5.565576e−23 C56.348497e−26 −1.141362e−25 −1.141362e−25 −1.966904e−26 −3.040396e−27 C65.204122e−29 3.028426e−29 3.028426e−29 −1.184645e−31 2.543798e−32 C70.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 C80.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 C90.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 SRF 1819 23 27 42 K 0 0 0 0 0 C1 2.672810e−08 2.775005e−08 −1.669000e−07−1.217647e−08 9.547564e−09 C2 −3.860076e−13 −4.185969e−13 −2.863948e−121.744126e−13 3.052025e−14 C3 −4.016442e−19 1.241612e−17 5.822813e−17−4.293560e−18 −1.353704e−17 C4 7.404508e−22 1.372267e−21 −1.894875e−212.525946e−22 1.116101e−21 C5 −2.355249e−26 −5.426320e−26 −6.837523e−25−7.956605e−27 −3.620235e−26 C6 3.556112e−31 1.048616e−30 1.669138e−292.582110e−31 7.221257e−31 C7 0.000000e+00 0.000000e+00 0.000000e+000.000000e+00 0.000000e+00 C8 0.000000e+00 0.000000e+00 0.000000e+000.000000e+00 0.000000e+00 C9 0.000000e+00 0.000000e+00 0.000000e+000.000000e+00 0.000000e+00 SRF 44 46 K 0 0 C1 7.852231e−10 8.538916e−08C2 −7.474578e−14 3.992913e−12 C3 1.525417e−16 −7.180100e−16 C48.737198e−21 3.099598e−22 C5 −1.853350e−25 −9.334126e−24 C6 2.659521e−291.130507e−27 C7 0.000000e+00 0.000000e+00 C8 0.000000e+00 0.000000e+00C9 0.000000e+00 0.000000e+00

TABLE 2 NA: 1.3, Field: A = 26 mm, B = 4, R = 14 mm, WL 193.368 nmSURFACE RADII THICKNESSES GLASSES INDEX ½ DIAMETER  0 0.0 57.601464 AIR1.00000000 72.000  1 −119.598919 AS 40.752708 SIO2 1.56078570 82.269  2−210.232462 2.023855 AIR 1.00000000 101.057  3 215.685827 66.865592 SIO21.56078570 128.153  4 −579.527028 0.998419 AIR 1.00000000 127.473  50.000000 15.000000 SIO2 1.56078570 123.835  6 0.000000 2.075403 AIR1.00000000 121.571  7 1216.286957 18.228954 SIO2 1.56078570 119.661  8−869.049699 AS 210.065231 AIR 1.00000000 117.523  9 −154.50301812.995617 SIO2 1.56078570 80.708 10 −558.821838 16.017211 AIR 1.0000000085.674 11 −235.158769 AS −16.017211 REFL 1.00000000 87.766 12−558.821838 −12.995617 SIO2 1.56078570 85.404 13 −154.503018 −190.064030AIR 1.00000000 76.527 14 −830.589177 AS 486.673979 REFL 1.0000000098.568 15 −410.985202 −193.020300 REFL 1.00000000 273.647 16 −437.290174113.125152 REFL 1.00000000 135.926 17 267.646367 AS 12.998513 SIO21.56078570 95.142 18 109.319044 71.810108 AIR 1.00000000 84.288 19−155.678245 24.706124 SIO2 1.56078570 85.404 20 −543.272055 4.335390 AIR1.00000000 99.062 21 24445.217145 13.950217 SIO2 1.56078570 104.821 22196.548934 AS 32.737178 AIR 1.00000000 116.137 23 −1380.847087 AS47.097422 SIO2 1.56078570 124.268 24 −312.879094 AS 12.293161 AIR1.00000000 129.120 25 270.274855 55.849255 SIO2 1.56078570 162.524 26−38956.530667 AS 29.047600 AIR 1.00000000 161.278 27 309.940005 AS62.710725 SIO2 1.56078570 161.189 28 −465.378574 12.984279 AIR1.00000000 161.962 29 −423.245186 17.988269 SIO2 1.56078570 160.698 30−775.040675 12.095938 AIR 1.00000000 162.998 31 0.000000 15.000000 SIO21.56078570 162.730 32 0.000000 26.456480 AIR 1.00000000 162.643 330.000000 0.000000 AIR 1.00000000 162.629 34 0.000000 −24.103637 AIR1.00000000 162.629 35 469.264272 28.933015 SIO2 1.56078570 163.056 361247.953833 1.106804 AIR 1.00000000 162.501 37 330.026166 57.681933 SIO21.56078570 162.159 38 −3249.855106 AS 0.998349 AIR 1.00000000 160.138 39154.864461 61.102740 SIO2 1.56078570 128.336 40 498.034349 AS 0.993535AIR 1.00000000 121.162 41 100.640590 44.902715 SIO2 1.56078570 87.015 42256.488347 AS 0.971666 AIR 1.00000000 74.934 43 84.324806 47.078122 SIO21.56078570 57.364 44 0.000000 1.000000 WATER 1.43667693 20.148 450.000000 0.000000 AIR 0.00000000 18.001 ASPHERIC CONSTANTS SRF 1 8 11 1417 K 0 0 0 0 0 C1 8.239862e−08 3.538306e−08 −3.277327e−09 −2.744235e−09−2.398764e−08 C2 2.337982e−12 −4.151996e−13 −1.091434e−13 1.866716e−131.254301e−12 C3 3.678382e−16 5.769308e−17 −1.991536e−18 −5.960771e−182.037512e−16 C4 −2.223105e−20 −2.411453e−21 2.984786e−24 3.073631e−22−4.065121e−20 C5 3.007844e−24 6.269400e−26 −6.132545e−27 −1.291587e−263.021671e−24 C6 −6.701338e−29 4.859807e−31 −3.611404e−32 2.791406e−31−8.808337e−29 C7 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+000.000000e+00 C8 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+000.000000e+00 C9 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+000.000000e+00 SRF 22 23 24 26 27 K 0 0 0 0 0 C1 −2.584292e−085.067971e−08 −1.189020e−08 2.911874e−08 −2.946438e−08 C2 −7.177953e−134.809462e−13 5.053313e−13 −4.562463e−13 4.758206e−18 C3 −1.126960e−16−8.588772e−17 −2.469630e−17 7.920650e−18 −1.104714e−17 C4 1.096561e−201.523536e−23 −7.975852e−23 −2.806318e−22 7.483230e−23 C5 −4.053220e−251.203472e−25 −1.085094e−26 5.644206e−27 −2.311461e−27 C6 4.947334e−30−1.922187e−30 −8.830951e−31 −7.020347e−32 −4.536924e−32 C7 0.000000e+000.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 C8 0.000000e+000.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 C9 0.000000e+000.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 SRF 38 40 42 K 0 0 0C1 1.303063e−08 −1.311818e−11 8.781384e−08 C2 −8.717504e−13 1.825033e−129.514823e−12 C3 1.035440e−17 −2.385113e−16 −6.587823e−16 C4 9.879529e−231.880562e−20 4.013727e−20 C5 −2.114495e−27 −7.119989e−25 1.218883e−24 C61.566842e−33 1.177690e−29 −6.344699e−28 C7 0.000000e+00 0.000000e+000.000000e+00 C8 0.000000e+00 0.000000e+00 0.000000e+00 C9 0.000000e+000.000000e+00 0.000000e+00

TABLE 3 NA: 1.35; Field: 26 mm × 5.5 mm; WL 193.368 nm SURFACE RADIITHICKNESSES GLASSES 193.368 nm ½ DIAMETER  0 0.000000 30.0000001.00000000 63.500  1 155.500468 47.980384 SIO2 1.56018811 82.822  2−333.324258 AS 1.000851 1.00000000 82.263  3 240.650949 10.194017 SIO21.56018811 79.900  4 106.801800 20.365766 1.00000000 74.667  5124.630972 34.680113 SIO2 1.56018811 79.588  6 468.398192 11.9816031.00000000 77.781  7 380.553803 AS 26.909838 SIO2 1.56018811 77.238  8−171.820449 19.336973 1.00000000 77.050  9 −3157.552773 18.733166 SIO21.56018811 63.691 10 −201.010840 AS 2.828885 1.00000000 61.535 110.000000 10.000000 SIO2 1.56018811 54.631 12 0.000000 14.0570311.00000000 51.301 13 −675.142412 17.151908 SIO2 1.56018811 45.967 14−177.431040 17.484199 1.00000000 49.621 15 0.000000 10.000000 SIO21.56018811 57.648 16 0.000000 48.376949 1.00000000 59.680 17 −339.50385322.085648 SIO2 1.56018811 72.901 18 −153.734447 9.426343 1.0000000075.785 19 −133.551892 10.000178 SIO2 1.56018811 76.547 20 −159.012061260.928174 1.00000000 80.555 21 −186.269426 AS −223.122910 REFL1.00000000 159.966 22 171.856468 AS 290.241437 REFL 1.00000000 137.56023 418.208640 33.119326 SIO2 1.56018811 109.835 24 −764.923828 24.9917121.00000000 109.215 25 −933.573206 23.101710 SIO2 1.56018811 104.458 261486.991752 AS 3.727360 1.00000000 103.086 27 264.108066 15.536565 SIO21.56018811 94.140 28 124.187755 40.232391 1.00000000 84.090 29−905.198558 AS 11.197639 SIO2 1.56018811 83.893 30 131.424652 22.2321191.00000000 82.631 31 288.907138 AS 18.371287 SIO2 1.56018811 85.149 321443.815086 26.039370 1.00000000 87.978 33 −219.723661 10.212957 SIO21.56018811 90.084 34 −505.370348 AS 1.495833 1.00000000 104.533 35602.513212 AS 45.614756 SIO2 1.56018811 113.361 36 −381.370078 0.9998171.00000000 124.374 37 −3646.793540 AS 62.876806 SIO2 1.56018811 133.44638 −186.442382 0.999658 1.00000000 138.789 39 803.321916 AS 47.355581SIO2 1.56018811 156.646 40 −403.820101 0.999375 1.00000000 158.048 41464.394742 43.310049 SIO2 1.56018811 156.920 42 −28298.847889 AS5.923544 1.00000000 155.749 43 0.000000 −4.924437 1.00000000 153.985 44452.887984 57.784133 SIO2 1.56018811 151.449 45 −566.954376 AS 1.0000001.00000000 149.326 46 114.038890 60.833075 SIO2 1.56018811 99.518 471045.400093 AS 1.000000 1.00000000 90.060 48 61.105427 43.354396 SIO21.56018811 51.240 49 0.000000 3.100000 H2O 1.43618227 24.415 50 0.0000000.000000 H2O 1.43618227 15.875 ASPHERIC CONSTANTS SURFACE 2 7 10 21 22 K0 0 0 −2.1798 −0.6806 C1 6.256157E−08 −3.919709E−07 −1.057407E−07−3.488371E−08 7.086654E−09 C2 3.982916E−12 2.095591E−11 4.580617E−112.874848E−13 1.057963E−13 C3 −9.451716E−16 9.822817E−16 −9.115065E−15−9.162279E−18 1.491672E−18 C4 1.335061E−19 −1.667379E−20 3.329325E−181.681271E−22 1.625713E−23 C5 −1.301313E−23 −4.323686E−23 −7.843408E−22−3.708622E−27 4.834151E−28 C6 8.344361E−28 5.150093E−27 1.064851E−254.914613E−32 −3.211541E−33 C7 −2.584534E−32 −2.098245E−31 −6.440967E−30−4.062945E−37 1.425318E−37 C8 0.000000E+00 0.000000E+00 0.000000E+000.000000E+00 0.000000E+00 C9 0.000000E+00 0.000000E+00 0.000000E+000.000000E+00 0.000000E+00 SURFACE 26 29 31 34 35 K 0 0 0 0 0 C1−2.253603E−07 2.933385E−08 4.633569E−09 1.036685E−07 −4.703595E−08 C21.351029E−11 3.990857E−13 −4.997364E−12 2.758011E−12 4.159400E−12 C33.795789E−17 −6.050500E−17 4.889637E−16 −3.278071E−16 −3.908920E−16 C4−7.421214E−20 1.255229E−19 −1.484469E−19 −2.153010E−20 1.644386E−20 C56.117939E−24 −1.877429E−23 1.977553E−23 1.089767E−24 −1.808670E−25 C6−2.347293E−28 1.072691E−27 −1.918985E−27 6.735329E−29 −1.857865E−29 C73.434091E−33 −3.218306E−32 8.501230E−32 −2.252218E−33 6.594092E−34 C80.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 C90.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 SURFACE37 39 K 0 0 C1 −1.945342E−10 −5.117066E−08 C2 −3.072667E−12 1.601404E−12C3 1.392672E−16 1.103417E−17 C4 −1.594346E−21 −7.047636E−22 C5−5.987158E−26 −3.288333E−26 C6 2.240055E−30 1.485188E−30 C7 0.000000E+00−1.523531E−35 C8 0.000000E+00 0.000000E+00 C9 0.000000E+00 0.000000E+00

TABLE 4 NA: 1.25; Field: 26 mm × 5.5 mm; WL: 193.3 nm SURFACE RADIITHICKNESSES GLASSES 193.3 nm ½ DIAMETER  0 0.000000 81.909100 1.0000000060.033  1 2048.443266 21.250400 SIO2 1.56032610 84.944  2 −397.1450260.999674 1.00000000 86.678  3 0.000000 9.999836 SIO2 1.56032610 88.251 4 0.000000 0.999631 1.00000000 89.202  5 148.901602 50.000000 SIO21.56032610 94.513  6 357.459757 52.494455 1.00000000 89.210  7183.941368 34.086800 SIO2 1.56032610 80.169  8 −464.124393 AS 3.4907231.00000000 76.925  9 91.427855 50.000000 SIO2 1.56032610 63.072 1093.895791 11.512540 1.00000000 42.632 11 0.000000 9.998981 SIO21.56032610 41.869 12 0.000000 9.386987 1.00000000 38.436 13 −94.98227150.000000 SIO2 1.56032610 38.838 14 −86.138668 8.374122 1.0000000054.696 15 −74.540104 38.657300 SIO2 1.56032610 55.419 16 −382.56488513.037213 1.00000000 82.587 17 −382.167395 50.066100 SIO2 1.5603261090.480 18 −117.361983 4.455250 1.00000000 96.112 19 −408.042301 AS43.871600 SIO2 1.56032610 102.130 20 −177.569466 9.816927 1.00000000106.603 21 289.476867 27.848300 SIO2 1.56032610 100.728 22 6501.4912110.998760 1.00000000 98.745 23 224.530994 27.157000 SIO2 1.5603261092.812 24 2986.561502 AS 75.000000 1.00000000 89.569 25 0.000000−226.222510 REFL 1.00000000 89.510 26 106.828577 AS −12.500000 SIO21.56032610 77.673 27 1042.751231 −49.965582 1.00000000 94.062 28111.149211 −12.500000 SIO2 1.56032610 94.838 29 212.774328 −26.1064091.00000000 122.137 30 155.022997 26.106409 REFL 1.00000000 124.612 31212.774328 12.500000 SIO2 1.56032610 122.115 32 111.149211 49.9655821.00000000 94.710 33 1042.751231 12.500000 SIO2 1.56032610 93.963 34106.828577 AS 226.222510 1.00000000 78.916 35 0.000000 −74.219082 REFL1.00000000 77.641 36 2294.592536 −22.331200 SIO2 1.56032610 79.528 37256.141486 −0.999710 1.00000000 82.627 38 −467.135025 −24.545000 SIO21.56032610 89.496 39 691.583098 −0.999310 1.00000000 90.566 40−233.607789 −45.979800 SIO2 1.56032610 93.086 41 −4942.551686 −4.6609651.00000000 90.501 42 −145.114796 −50.000000 SIO2 1.56032610 86.173 43−503.288735 AS −13.136267 1.00000000 76.698 44 763.625290 −12.500000SIO2 1.56032610 75.648 45 −95.483381 AS −39.092954 1.00000000 66.704 46−6058.472160 −12.500000 SIO2 1.56032610 69.545 47 −149.880323 AS−15.887220 1.00000000 73.780 48 −503.080539 −30.687700 SIO2 1.5603261076.357 49 1171.552640 −77.445168 1.00000000 83.009 50 −3285.578928 AS−22.658500 SIO2 1.56032610 120.317 51 596.398897 −0.998775 1.00000000123.080 52 −357.977963 −33.153400 SIO2 1.56032610 136.416 53−3248.236982 −1.812371 1.00000000 136.760 54 −308.579307 −49.249300 SIO21.56032610 139.626 55 836.621146 AS −11.829470 1.00000000 138.580 560.000000 2.947366 1.00000000 134.942 57 −784.542969 −35.882400 SIO21.56032610 134.087 58 1336.948853 −3.431255 1.00000000 131.711 59−322.438168 −35.943900 SIO2 1.56032610 123.107 60 3281.822778 −2.3927131.00000000 120.250 61 −131.283783 −28.495000 SIO2 1.56032610 95.317 62−199.868775 AS −1.086856 1.00000000 88.629 63 −96.539151 −34.303600 SIO21.56032610 76.133 64 −225.944484 AS −1.323326 1.00000000 66.927 65−61.472761 −50.000000 SIO2 1.56032610 49.298 66 0.000000 −1.000000 H2O1.43681630 16.573 67 0.000000 0.001593 H2O 1.43681630 15.013 ASPHERICCONSTANTS SURFACE 8 19 24 26 34 K 0 0 0 0 0 C1 7.931903E−08−1.177647E−08 1.310659E−08 −8.713192E−08 −8.713192E−08 C2 3.361972E−134.916744E−13 2.349673E−13 −3.312749E−12 −3.312749E−12 C3 2.733335E−16−1.906952E−17 −1.627068E−17 −1.959490E−16 −1.959490E−16 C4 −2.918068E−203.642462E−23 2.940777E−22 −1.644695E−20 −1.644695E−20 C5 1.460982E−245.759228E−27 1.581363E−26 1.961941E−25 1.961941E−25 C6 −1.007942E−29−5.176777E−32 −8.636738E−31 −1.613799E−28 −1.613799E−28 C7 0.000000E+000.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 C8 0.000000E+000.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 C9 0.000000E+000.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 SURFACE 43 45 47 5055 K 0 0 0 0 0 C1 −3.218290E−08 −1.408460E−08 3.765640E−08 1.544290E−08−9.784690E−09 C2 4.089760E−13 3.732350E−12 2.045650E−12 −1.526310E−132.155450E−14 C3 9.461900E−17 5.781700E−17 6.726610E−17 −1.172350E−17−2.664880E−17 C4 −1.126860E−20 4.020440E−20 3.357790E−21 −3.026260E−221.199020E−21 C5 1.093490E−24 1.811160E−24 −5.515760E−25 −2.050700E−28−2.503210E−26 C6 −2.303040E−29 −3.465020E−28 2.958290E−28 3.614870E−312.100160E−31 C7 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+000.000000E+00 C8 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+000.000000E+00 C9 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+000.000000E+00 SURFACE 62 64 K 0 0 C1 2.762150E−09 −1.082280E−07 C2−4.067930E−12 −9.511940E−12 C3 4.513890E−16 1.146050E−15 C4−5.070740E−20 −1.274000E−19 C5 1.839760E−24 1.594380E−23 C6−6.225130E−29 −5.731730E−28 C7 0.000000E+00 0.000000E+00 C8 0.000000E+000.000000E+00 C9 0.000000E+00 0.000000E+00

TABLE 5 NA: 1.25; Field: 26 mm × 4.9 mm; WL: 193.3 nm SURFACE RADIITHICKNESSES GLASSES 193.3 nm ½ DIAMETER  0 0.000000 81.909100 1.0000000060.033  1 673.366211 21.250400 SIO2 1.56032610 86.143  2 −352.3826991.000526 1.00000000 86.826  3 0.000000 9.999922 SIO2 1.56032610 87.758 4 0.000000 0.999828 1.00000000 88.266  5 146.180992 50.000000 SIO21.56032610 90.960  6 235.663997 47.614073 1.00000000 83.553  7232.803962 34.086800 SIO2 1.56032610 77.655  8 −525.462527 AS 3.2478571.00000000 74.135  9 92.851551 50.000000 SIO2 1.56032610 62.809 10101.676358 27.396923 1.00000000 43.995 11 −98.402976 50.000000 SIO21.56032610 40.939 12 −87.452301 10.624080 1.00000000 57.044 13−84.711067 38.657300 SIO2 1.56032610 58.874 14 −263.404585 18.8503281.00000000 81.979 15 −324.827786 50.066100 SIO2 1.56032610 92.383 16−134.730834 1.001012 1.00000000 100.760 17 −387.701255 AS 43.871600 SIO21.56032610 105.897 18 −169.182822 1.411725 1.00000000 110.197 19286.958322 27.848300 SIO2 1.56032610 103.540 20 2339.112166 1.0403381.00000000 101.350 21 215.327689 27.157000 SIO2 1.56032610 95.069 222556.542175 AS 72.132498 1.00000000 92.199 23 0.000000 −222.554121 REFL1.00000000 98.569 24 106.814945 AS −12.500000 SIO2 1.56032610 78.634 25967.943813 −49.007290 1.00000000 95.483 26 114.522293 −12.500000 SIO21.56032610 96.351 27 209.321713 −24.703185 1.00000000 122.199 28155.317015 24.703185 REFL 1.00000000 124.370 29 209.321713 12.500000SIO2 1.56032610 121.966 30 114.522293 49.007290 1.00000000 95.525 31967.943813 12.500000 SIO2 1.56032610 93.838 32 106.814945 AS 222.5541211.00000000 78.764 33 0.000000 −61.000000 REFL 1.00000000 74.683 341428.935254 −22.331200 SIO2 1.56032610 73.779 35 228.264696 −1.0013011.00000000 77.285 36 −462.657333 −24.545000 SIO2 1.56032610 84.167 37885.483366 −1.000977 1.00000000 85.694 38 −231.030433 −45.979800 SIO21.56032610 88.807 39 5456.439341 −1.000168 1.00000000 87.032 40−141.980854 −50.000000 SIO2 1.56032610 83.909 41 −487.877853 AS−11.892025 1.00000000 74.753 42 744.304505 −12.500000 SIO2 1.5603261074.160 43 −95.471841 AS −30.584840 1.00000000 66.061 44 17792.738608−12.500000 SIO2 1.56032610 67.093 45 −154.563738 AS −17.2874041.00000000 71.817 46 −452.042111 −30.687700 SIO2 1.56032610 77.085 47669.871673 −100.369522 1.00000000 82.829 48 3548.735563 AS −22.658500SIO2 1.56032610 125.594 49 472.295389 −4.772413 1.00000000 128.352 50−366.259271 −33.153400 SIO2 1.56032610 144.068 51 −12361.700432−9.333978 1.00000000 144.157 52 −317.083167 −49.249300 SIO2 1.56032610146.304 53 962.293169 AS −0.700250 1.00000000 144.982 54 0.000000−4.992187 1.00000000 143.559 55 0.000000 −9.997236 SIO2 1.56032610143.164 56 0.000000 −0.992199 1.00000000 142.040 57 −657.958896−35.882400 SIO2 1.56032610 139.908 58 1515.969802 −0.992804 1.00000000137.743 59 −260.738714 −35.943900 SIO2 1.56032610 126.043 60−5237.030792 −0.993752 1.00000000 124.160 61 −119.057555 −28.495000 SIO21.56032610 94.444 62 −163.229803 AS −0.992865 1.00000000 87.366 63−102.409442 −34.303600 SIO2 1.56032610 77.909 64 −186.405022 AS−0.987636 1.00000000 65.364 65 −66.199250 −50.000000 SIO2 1.5603261050.686 66 0.000000 −1.000000 H2OV 1.43681630 16.566 67 0.000000 0.001593H2OV 1.43681630 15.013 ASPHERIC CONSTANTS SURFACE 8 17 22 24 32 K 0 0 00 0 C1 5.233631E−08 −1.143718E−08 1.521494E−08 −8.173584E−08−8.173584E−08 C2 −4.247769E−13 4.539000E−13 2.236265E−13 −3.442666E−12−3.442666E−12 C3 2.264621E−16 −2.603436E−17 −2.309696E−17 −1.945129E−16−1.945129E−16 C4 −3.544742E−21 1.689629E−22 9.703692E−22 −1.379025E−20−1.379025E−20 C5 −2.689319E−24 9.802414E−27 −2.535866E−26 −1.501650E−26−1.501650E−26 C6 1.772618E−28 −2.612406E−31 2.286605E−31 −1.600981E−28−1.600981E−28 C7 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+000.000000E+00 C8 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+000.000000E+00 C9 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+000.000000E+00 SURFACE 41 43 45 48 53 K 0 0 0 0 0 C1 −3.218290E−08−1.408460E−08 3.765640E−08 1.375675E−08 −1.293407E−08 C2 4.089760E−133.732350E−12 2.045650E−12 −1.650648E−13 8.171098E−14 C3 9.461900E−175.781700E−17 6.726610E−17 −7.725229E−18 −2.315997E−17 C4 −1.126860E−204.020440E−20 3.357790E−21 −8.878454E−23 1.220861E−21 C5 1.093490E−241.811160E−24 −5.515760E−25 −3.024502E−27 −3.871131E−26 C6 −2.303040E−29−3.465020E−28 2.958290E−28 7.260257E−31 8.195620E−31 C7 0.000000E+000.000000E+00 0.000000E+00 −3.056481E−35 −1.127163E−35 C8 0.000000E+000.000000E+00 0.000000E+00 5.105060E−40 7.656900E−41 C9 0.000000E+000.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 SURFACE 62 64 K 0 0C1 2.762150E−09 −1.082280E−07 C2 −4.067930E−12 −9.511940E−12 C34.513890E−16 1.146050E−15 C4 −5.070740E−20 −1.274000E−19 C5 1.839760E−241.594380E−23 C6 −6.225130E−29 −5.731730E−28 C7 0.000000E+00 0.000000E+00C8 0.000000E+00 0.000000E+00 C9 0.000000E+00 0.000000E+00

TABLE 6 NA: 1.55; Field: 13 mm × 5 mm; WL: 193.3 nm SURFACE RADIITHICKNESSES GLASSES 193.368 nm ½ DIAMETER  0 0.000000 30.0000001.00000000 28.040  1 −45.394016 AS 6.635689 SIO2 1.56049116 34.957  22151.515917 16.545348 1.00000000 46.807  3 −83.051561 28.566059 SIO21.56049116 47.891  4 −119.065543 AS 0.500000 1.00000000 69.316  50.000000 10.000000 SIO2 1.56049116 94.621  6 0.000000 1.0000001.00000000 99.921  7 2530.299735 63.349995 SIO2 1.56049116 103.248  8−135.649196 0.500000 1.00000000 107.463  9 311.093341 39.925564 SIO21.56049116 121.003 10 −493.635417 AS 0.500000 1.00000000 120.604 11133.444606 61.067502 SIO2 1.56049116 117.509 12 374.542254 0.5000001.00000000 113.040 13 84.632149 51.590152 SIO2 1.56049116 81.754 1488.648479 25.127474 1.00000000 63.232 15 307.626412 AS 9.334872 SIO21.56049116 62.312 16 43.760171 42.700144 1.00000000 40.624 17 −62.8669227.971264 SIO2 1.56049116 40.618 18 −239.625085 AS 24.317933 1.0000000045.475 19 −50.648163 40.253476 SIO2 1.56049116 45.709 20 −149.8751560.500000 1.00000000 83.162 21 −2133.410799 AS 63.096865 SIO2 1.56049116100.727 22 −125.285708 0.500000 1.00000000 109.440 23 −26011.02705165.192910 SIO2 1.56049116 140.404 24 −203.948605 0.500000 1.00000000142.582 25 193.874995 64.570959 SIO2 1.56049116 136.803 26 −1131.653398AS 0.500000 1.00000000 133.946 27 101.431520 69.833756 CAF2 1.5011059297.569 28 92.297418 0.500000 1.00000000 69.924 29 70.344368 54.208844CAF2 1.50110592 63.058 30 43.124915 AS 48.219058 1.00000000 30.693 31−49.524613 19.920470 CAF2 1.50110592 32.075 32 458.868681 67.965960 SIO21.56049116 75.933 33 −92.104256 0.500000 1.00000000 83.821 34 518.81609240.830736 SIO2 1.56049116 130.987 35 −593.727113 0.500000 1.00000000133.184 36 554.922603 47.451002 SIO2 1.56049116 141.932 37 −313.882110AS 54.465535 1.00000000 142.459 38 0.000000 10.000000 SIO2 1.56049116143.113 39 0.000000 5.000000 1.00000000 143.170 40 388.722555 30.775375SIO2 1.56049116 143.454 41 1862.901509 0.997362 1.00000000 142.272 42198.712780 AS 66.525407 SIO2 1.56049116 136.261 43 −514.840049 0.5000001.00000000 134.178 44 85.045649 44.185930 SIO2 1.56049116 81.693 45145.661446 AS 17.247660 1.00000000 74.191 46 0.000000 −16.3482231.00000000 80.280 47 92.090812 57.694536 CAF2 1.50110592 67.945 4847.458170 AS 1.000000 1.00000000 28.748 49 38.518298 19.946111 LUAG2.14000000 25.820 50 0.000000 3.000000 CYCLOHEXAN 1.65000000 15.292 510.000000 0.000000 CYCLOHEXAN 1.65000000 7.033 ASPHERIC CONSTANTS SURFACE1 4 10 15 18 K 0 0 0 0 0 C1 2.222335E−06 2.157480E−07 1.213751E−08−7.024709E−07 −9.624575E−07 C2 −2.960106E−10 −3.703032E−11 3.933709E−121.889675E−10 3.626064E−10 C3 4.099432E−14 −7.688081E−15 −2.029701E−16−3.670917E−14 −7.017458E−14 C4 8.830630E−18 1.855665E−18 4.960091E−217.174517E−18 3.203346E−17 C5 2.738367E−21 −2.075437E−22 −9.428631E−26−1.086191E−21 3.301669E−21 C6 −4.634945E−24 2.467311E−27 2.722400E−307.269040E−26 1.937988E−25 C7 0.000000E+00 0.000000E+00 0.000000E+000.000000E+00 0.000000E+00 C8 0.000000E+00 0.000000E+00 0.000000E+000.000000E+00 0.000000E+00 C9 0.000000E+00 0.000000E+00 0.000000E+000.000000E+00 0.000000E+00 SURFACE 21 26 30 37 42 K 0 0 0 0 0 C1−1.923992E−07 2.460562E−08 2.978434E−07 4.796558E−08 −5.884188E−09 C21.538439E−11 −9.931095E−13 −2.509878E−10 −1.062531E−12 −1.581977E−12 C3−5.149355E−16 1.592698E−16 −2.512252E−13 2.364210E−17 −3.047715E−17 C4−2.897216E−20 −1.093197E−20 −6.241269E−17 −5.051762E−22 1.097254E−22 C53.826170E−24 3.840316E−25 −2.651403E−21 1.467614E−26 4.543670E−26 C6−1.269936E−28 −5.374727E−30 −7.813369E−25 −8.111221E−32 −1.393249E−31 C70.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 C80.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 C90.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 0.000000E+00 SURFACE45 48 K 0 0 C1 2.457177E−07 −4.614167E−06 C2 −2.166219E−11 7.262309E−09C3 2.975343E−15 −1.885463E−11 C4 −5.958384E−19 3.520215E−14 C52.562257E−24 −3.028402E−17 C6 6.910021E−27 1.073889E−20 C7 0.000000E+000.000000E+00 C8 0.000000E+00 0.000000E+00 C9 0.000000E+00 0.000000E+00

TABLE 7 NumAp 1.32 y′ 15.16 SURFACE RADII THICKNESSES MATERIAL INDEX ½DIAMETER  0 0.000000 113.754200 60.6  1 0.000000 8.000000 SILUV 1.560482100.5  2 0.000000 6.000000 102.2  3 930.923922 52.000000 SILUV 1.560482106.4  4 −256.201417 1.000000 110.0  5 164.802556 35.773100 SILUV1.560482 110.4  6 341.545138 15.747900 107.3  7 147.535157 56.488000SILUV 1.560482 97.6  8 −647.942934 4.145000 91.4  9 −536.07147818.297900 SILUV 1.560482 89.4 10 180.585020 1.000000 71.6 11 82.24709628.431900 SILUV 1.560482 64.3 12 121.636868 21.482876 56.7 13 0.00000010.000000 SILUV 1.560482 51.2 14 0.000000 35.037652 47.0 15 −89.60179144.878000 SILUV 1.560482 50.3 16 −203.308357 49.953200 72.8 17−333.934057 37.672400 SILUV 1.560482 98.4 18 −153.471299 1.000000 104.519 −588.427923 47.008300 SILUV 1.560482 113.3 20 −177.569099 1.000000116.9 21 1289.635452 32.747800 SILUV 1.560482 114.7 22 −409.7909251.000000 114.2 23 196.979548 36.289500 SILUV 1.560482 103.1 242948.592605 72.000000 99.3 25 0.000000 −204.306500 REFL 68.2 26120.965260 −15.000000 SILUV 1.560482 67.6 27 177.749728 −28.181900 76.728 106.065668 −18.000000 SILUV 1.560482 81.8 29 323.567743 −34.983200113.6 30 165.900097 34.983200 REFL 119.8 31 323.567743 18.000000 SILUV1.560482 115.6 32 106.065668 28.181900 88.3 33 177.749728 15.000000SILUV 1.560482 87.2 34 120.965260 204.306500 79.0 35 0.000000 −72.000000REFL 64.8 36 462.513697 −24.493400 SILUV 1.560482 92.9 37 196.771640−1.000000 96.3 38 −996.046057 −27.579900 SILUV 1.560482 106.5 39480.084349 −1.000000 108.1 40 −260.478322 −35.771400 SILUV 1.560482113.0 41 −3444.700345 −1.000000 111.8 42 −189.044457 −50.000000 SILUV1.560482 107.6 43 −630.985131 −43.198700 99.6 44 675.856906 −10.000000SILUV 1.560482 88.6 45 −117.005373 −46.536000 79.9 46 214.318111−10.000000 SILUV 1.560482 79.8 47 −191.854301 −23.664400 93.5 481573.576031 −31.506600 SILUV 1.560482 94.4 49 214.330939 −1.000000 100.350 −322.859172 −33.185600 SILUV 1.560482 133.7 51 −1112.917245−10.017200 135.5 52 −2810.857827 −22.000000 SILUV 1.560482 137.0 53−920.532878 −42.079900 145.9 54 707.503574 −62.025500 SILUV 1.560482146.3 55 238.350224 −1.000000 157.1 56 −17926.557240 −62.132800 SILUV1.560482 178.0 57 336.363925 −2.000000 179.9 58 0.000000 −10.000000SILUV 1.560482 179.0 59 0.000000 −51.180119 178.9 60 0.000000 48.529765178.0 61 −303.574400 −68.224400 SILUV 1.560482 179.0 62 −19950.680601−7.986643 177.0 63 −182.034245 −77.612200 SILUV 1.560482 150.7 64−459.526735 −1.000000 141.5 65 −130.446554 −49.999900 SILUV 1.560482105.5 66 −393.038792 −1.000000 91.8 67 −76.745086 −43.335100 SILUV1.560482 62.7 68 0.000000 −1.000000 H2OV 1.435876 45.3 69 0.000000−13.000000 SILUV 1.560482 43.0 70 0.000000 −3.000396 H2OV 1.435876 22.271 0.000000 0.000000 15.2 ASPHERIC CONSTANTS SURFACE 9 17 24 43 47 K 0 00 0 0 C1 −6.152794E−08 −7.450948E−09 2.397578E+00 8 −1.544441e8.902497E−08 C2 9.072358E−12 −4.968691E−13 −3.992688E−01 3 4.805552e−4.455899E−12 C3 −7.620162E−16 −1.804573E−17 7.587147E−01 8 −6.813171e3.521620E−16 C4 2.116045E−20 1.214276E−21 −4.079078E−02 3 −4.666592e−2.121932E−20 C5 2.963576E−24 5.493721E−27 −1.807190E−02 6 1.242732e2.642521E−25 C6 −3.075337E−28 −5.299803E−30 1.560768E−03 0 −9.557499e1.245058E−28 C7 9.068617E−33 1.870242E−34 −4.466502E−03 5 2.284660e−6.144810E−33 SURFACE 48 51 53 54 64 66 K 0 0 0 0 0 0 C1 2.768189E−081.787600E−08 −3.738135E+00 8 1.728194e 3.264015E−08 −6.538685E−08 C2−1.657627E−12 −3.785102E−13 −8.195730E−01 3 −6.690131e −2.291400E−12−1.101880E−13 C3 1.596547E−17 −9.909771E−17 1.196846E−01 6 1.379584e1.419559E−16 −2.522891E−16 C4 −5.508505E−21 4.442167E−21 −2.578914E−02 1−5.773921e −6.671541E−21 2.782014E−20 C5 5.521223E−25 −1.566662E−25−3.008537E−02 6 1.736082e 2.032317E−25 −3.073204E−24 C6 −1.359008E−286.868774E−30 1.836351E−03 0 −3.718468e −3.619015E−30 1.726081E−28 C78.927631E−33 −1.167559E−34 −2.233659E−03 5 6.530703e 2.871756E−35−5.631877E−33

1. A projection objective, comprising: an optical arrangement of opticalelements between an object plane of the projection objective and animage plane of the projection objective, the optical arrangement havingat least one intermediate image plane, the optical arrangement,comprising: a first correction element arranged optically at least inthe vicinity of a pupil plane of the projection objective; and a secondcorrection element arranged in a region which is not optically neareither the pupil plane of the projection objective or a field plane ofthe projection objective, wherein the projection objective is configuredto be used as a lithographic projection objective.
 2. The projectionobjective of claim 1, wherein the position of the first correactionelement is selected such that the absolute value of a ratio ofprincipal-ray height to marginal-ray height at this position is lessthan 1/n, where n equals 5, 10 or
 20. 3. The projection objective ofclaim 1, wherein the position of the second correction element isselected such that the absolute value of a ratio of principal-ray heightto marginal-ray height at this position is greater than 1/m, but lessthan p/10, where m equals 5, 10 or 20, and p equals 17, 20, 25, 35 or55.
 4. The projection objective of claim 1, wherein, seen in the lightpropagation direction, the arrangement of optical elements furthercomprises: a first subassembly capable of imaging the object plane via afirst pupil plane of the projection objective into the at least oneintermediate image plane; and a second subassembly capable of imagingthe at least one intermediate image plane via a second pupil plane ofthe projection objective into the image plane, wherein: the firstcorrection element is arranged optically at least in the vicinity of thesecond pupil plane; the second correction element is arranged downstreamof the at least one intermediate image plane; the second correctionelement is arranged upstream of the second pupil plane; and the secondcorrection element is not optically near either the at least oneintermediate image plane or the second pupil plane.
 5. The projectionobjective of claim 1, wherein, seen in the light propagation direction,the arrangement of optical elements further comprises: a firstsubassembly capable of imaging the object plane via a first pupil planeof the projection objective into the at least one intermediate imageplane; and a second subassembly capable of imaging the at least oneintermediate image plane via a second pupil plane of the projectionobjective into the image plane, wherein: the first correction element isarranged optically at least in the vicinity of the second pupil plane;the second correction element is arranged upstream of the first pupilplane; and the second correction element is not optically near eitherthe object plane or the first pupil plane.
 6. The projection objectiveof claim 1, wherein the at least one intermediate image plane includesfirst and second intermediate image planes, and seen in the lightpropagation direction, the arrangement of optical elements furthercomprises: a first subassembly capable of imaging the object plane via afirst pupil plane of the projection objective into the firstintermediate image plane; a second subassembly capable of imaging thefirst intermediate image plane via a second pupil plane of theprojection objective into the second intermediate image plane; and athird subassembly capable of imaging the second intermediate image planevia a third pupil plane of the projection objective into the imageplane, wherein: the first correction element is arranged optically atleast in the vicinity of the first pupil plane; the second correctionelement is arranged between the first pupil plane and the firstintermediate image plane; and the second correction element is notoptically near either the first pupil plane or the first intermediateimage plane.
 7. The projection objective of claim 1, wherein the atleast one intermediate image plane includes first and secondintermediate image planes, and seen in the light propagation direction,the arrangement of optical elements further comprises: a firstsubassembly capable of imaging the object plane via a first pupil planeof the projection objective into the first intermediate image plane; asecond subassembly capable of imaging the first intermediate image planevia a second pupil plane into the second intermediate image plane; and athird subassembly capable of imaging the second intermediate image planevia a third pupil plane of the projection objective into the imageplane, wherein: the first correction element is arranged optically atleast in the vicinity of the first pupil plane; the second correctionelement is arranged between the object plane and the first pupil plane;and the second correction element is not optically near either theobject plane or the first pupil plane.
 8. The projection objective ofclaim 7, wherein a third correction element is arranged optically atleast in the vicinity of the third pupil plane.
 9. The projectionobjective of claim 1, wherein the at least one intermediate image planeincludes first and second intermediate image planes, and seen in thelight propagation direction, the arrangement of optical elements furthercomprises: a first subassembly capable of imaging the object plane via afirst pupil plane of the projection objective into a first intermediateimage plane; a second subassembly capable of imaging the firstintermediate image plane via a second pupil plane of the projectionobjective into a second intermediate image plane; and a thirdsubassembly capable of imaging the second intermediate image plane via athird pupil plane of the projection objective into the image plane,wherein: the first correction element is arranged optically at least inthe vicinity of the third pupil plane; the second correction element isarranged between the object plane and the first pupil plane; and thesecond correction element is not optically near either the object planeor the first pupil plane.
 10. The projection objective of claim 1,wherein, seen in the light propagation direction, the arrangement ofoptical elements further comprises: a first subassembly capable ofimaging the object plane via a first pupil plane of the projectionobjective into the at least one intermediate image plane; and a secondsubassembly capable of imaging the at least one intermediate image planeinto the image plane, wherein: the first correction element is arrangedoptically at least in the vicinity of the first pupil plane; the secondcorrection element is arranged between the object plane and the firstpupil plane; and the second correction element is not optically near theobject plane nor the first pupil plane.
 11. The projection objective ofclaim 1, wherein the optical arrangement comprises precisely twocorrection elements or three correction elements.
 12. The projectionobjective of claim 1, wherein at least one of the correction elementscan be exchanged during the operation of the projection objective. 13.The projection objective of claim 1, wherein at least one of thecorrection elements is a plane plate.
 14. The projection objective ofclaim 1, wherein at least one of the correction elements has anaspherization.
 15. The projection objective of claim 1, wherein at leastone of the correction elements can be actively deformed.
 16. Theprojection objective of claim 1, wherein at least one of the correctionelements can be thermally manipulated.
 17. The projection objective ofclaim 1, wherein at least one of the correction elements can be adjustedin position.
 18. A machine, comprising: the projection objective ofclaim 1, wherein the machine is a lithographic projection exposuremachine.
 19. A method, comprising: using the projection of objective ofclaim 1 to produce a semiconductor.
 20. The method of claim 19,comprising using the projection objective to image a reticle onto asubstrate.